Kojima Akihiro | Process and Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan
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Process and Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan | 論文
- Dual-Frequency Superimposed RF Capacitive-Coupled Plasma Etch Process
- Threshold Voltage Control of Hf-based High-$\kappa$ Gate Stack System by Fluorine Incorporation into Channel and Its Impact on Short-Channel Characteristics