OHSHIMA Hisayoshi | Research Laboratories Nippondenso Co., Ltd.
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概要
Research Laboratories Nippondenso Co., Ltd. | 論文
- H_2 Partial Pressure Dependences of CH_3 Radical Density and Effects of H_2 Dilution on Carbon Thin-Film Formation in RF Discharge CH_4 Plasma
- Effect of Rare Gas Dilution on CH_3 Radical Density in RF-Discharge CH_4 Plasma
- Correlation between CH_3 Radical Density and Carbon Thin-Film Formation in RF Discharge CH_4 Plasma
- Calculated Three Dimensional Spatial Distribution of CH_3 Radical Density in the RF Discharge CH_4 Plasma with Parallel-Plate Electrodes
- Characterization of HF-Treated Si Surfaces by Photoluminescence Spectroscopy