Jiro Temmyo | Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8011, Japan
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Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8011, Japan | 論文
- Thermal Agglomeration of Ultrathin Silicon-on-Insulator Layers: Crystalline Orientation Dependence
- Pulsed Supermagnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Nitride Films
- Single-Gated Single-Electron Transfer in Nonuniform Arrays of Quantum Dots
- Luminescence Properties of Amorphous Carbon Films Formed Using Supermagnetron Plasma
- Oxidation of Amorphous Carbon Films by Ultraviolet Light Irradiation and Thermal Annealing