HAMA Toshio | Fuji Electric Corporate Research and Development, Ltd.
スポンサーリンク
概要
Fuji Electric Corporate Research and Development, Ltd. | 論文
- Relationship between Surface Roughness and Barrier Uniformity
- Cross-Sectional Observation in (103)-Oriented YBa_2Cu_3O_x/SrTiO_3/(013)-Oriented YBa_2Cu_3O_x Tunnel Junction
- Fabrication of Tunnel Junctions with YBCO/Insulator/YBCO Layered Structure Using (013)-Oriented Films as Base Layer
- Observation of Interface Stress in Barrier/Y-Ba-Cu-O Structure by Laser Raman Scattering Spectroscopy
- Sputter Deposition of YBa_2Cu_3O_ Thin Films with Low Gas Pressure