ICHIHARA Katsutaro | Materials and Devices Laboratories, Toshiba Research and Development Center
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概要
Materials and Devices Laboratories, Toshiba Research and Development Center | 論文
- Improvement in the Uniformity of Resistivity in a Magnetron-Sputtered Indium Tin Oxide Film by Controlling the Plasma Flux Distribution ( Plasma Processing)
- Carrier Injection Characteristics of Organic Electroluminescent Devices