Yoshino Takenobu | Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8569, Japan
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概要
- Yoshino Takenobuの詳細を見る
- 同名の論文著者
- Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8569, Japanの論文著者
関連著者
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Hata Nobuhiro
Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Science And
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Yoshino Takenobu
Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Science And
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Hata Nobuhiro
Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8569, Japan
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Yoshino Takenobu
Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8569, Japan
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Takimura Toshinori
Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Science And Technology
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Seino Yutaka
Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol
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Takada Syozo
Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Science And Technology
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Ohnuki Nobuyoshi
Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8569, Japan
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Takada Syozo
Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8569, Japan
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Takimura Toshinori
Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8569, Japan
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Seino Yutaka
Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8569, Japan
著作論文
- Young’s Modulus Enhancement of Mesoporous Pure-Silica–Zeolite Low-Dielectric-Constant Films by Ultraviolet and Silylation Treatments
- Determination of Mechanical Properties of Porous Silica Low-$k$ Films on Si Substrates Using Orientation Dependence of Surface Acoustic Wave