Higgins Craig | College of Nanoscale Science and Engineering, University at Albany, Albany, NY 12203, U.S.A.
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概要
- Higgins Craig D.の詳細を見る
- 同名の論文著者
- College of Nanoscale Science and Engineering, University at Albany, Albany, NY 12203, U.S.A.の論文著者
関連著者
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Higgins Craig
College of Nanoscale Science and Engineering, University at Albany, Albany, NY 12203, U.S.A.
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Seth Kruger
College of Nanoscale Science and Engineering, University at Albany, NY 12203, U.S.A
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Kruger Seth
College of Nanoscale Science and Engineering, University at Albany, NY 12203, U.S.A
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Higgins Craig
College of Nanoscale Science and Engineering, University at Albany, NY 12203, U.S.A
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Revuru Srividya
State University of New York at New Paltz, NY 12561, U.S.A.
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Sarah Gibbons
College of Nanoscale Science and Engineering, University at Albany, NY 12203, U.S.A
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Dan Freedman
State University of New York at New Paltz, NY 12561, U.S.A.
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Robert L.
College of Nanoscale Science and Engineering, University at Albany, NY 12203, U.S.A
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Denbeaux Greg
College of Nanoscale Science and Engineering, University at Albany, Albany, NY 12203, U.S.A.
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Srividya Revuru
State University of New York at New Paltz, NY 12561, U.S.A.
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Georger Jacque
SEMATECH, Albany, NY 12203, U.S.A.
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Szmanda Charles
The Patent Practice of Szmanda & Shelnut, LLC, Westborough, MA 01581, U.S.A.
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Antohe Alin
College of Nanoscale Science and Engineering, University at Albany, Albany, NY 12203, U.S.A.
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Brainard Robert
College of Nanoscale Science and Engineering, University at Albany, Albany, NY 12203, U.S.A.
著作論文
- Resolution, Line-Edge Roughness, Sensitivity Tradeoff, and Quantum Yield of High Photo Acid Generator Resists for Extreme Ultraviolet Lithography
- Can Acid Amplifiers Help Beat the Resolution, Line Edge Roughness, and Sensitivity Trade-Off?