Shutov Dmitriy | Department of Electronic Devices and Materials Technology, Ivanovo State University of Chemistry and Technology, 7 F. Engels st., 153000 Ivanovo, Russia
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概要
- Shutov Dmitriy Alexandrovichの詳細を見る
- 同名の論文著者
- Department of Electronic Devices and Materials Technology, Ivanovo State University of Chemistry and Technology, 7 F. Engels st., 153000 Ivanovo, Russiaの論文著者
関連著者
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Kwon Kwang-ho
Department Of Electronic Engineering Hanseo University
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Baek Kyu-Ha
IT Convergence and Components Laboratory, ETRI, 161 Gajeong-dong, Yuseong-gu, Daejeon 305-700, Republic of Korea
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Kang Seung-Youl
IT Convergence and Components Laboratory, ETRI, 161 Gajeong-dong, Yuseong-gu, Daejeon 305-700, Republic of Korea
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Shutov Dmitriy
Department of Electronic Devices and Materials Technology, Ivanovo State University of Chemistry and Technology, 7 F. Engels st., 153000 Ivanovo, Russia
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Suh Kyung
IT Convergence and Components Laboratory, ETRI, 161 Gajeong-dong, Yuseong-gu, Daejeon 305-700, Republic of Korea
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KWON Kwang-Ho
Department of Control and Instrumentation Engineering, Korea University
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Min Nam-Ki
Department of Control and Instrumentation Engineering, Korea University, Jochiwon, Chungnam 339-700, Republic of Korea
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Min Nam-Ki
Department of Biomicrosystem, Korea University, Seoul 136-713, Republic of Korea
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Baek Kyu-Ha
IT Convergence and Components Laboratory, ETRI, 161 Gajeong-dong, Yuseong-gu, Daejeon, 305-700, Republic of Korea
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Kang Seung-Youl
IT Convergence and Components Laboratory, ETRI, 161 Gajeong-dong, Yuseong-gu, Daejeon, 305-700, Republic of Korea
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Suh Kyung
IT Convergence and Components Laboratory, ETRI, 161 Gajeong-dong, Yuseong-gu, Daejeon, 305-700, Republic of Korea
著作論文
- Kinetics of Chemical Changes in Phenol Formaldehyde Based Polymeric Films Etched in N2O and O2 Inductively Coupled Plasmas: A Comparative Study
- Influence of Ar and NH3 Plasma Treatment on Surface of Poly(monochloro-para-xylylene) Dielectric Films Processed in Oxygen Plasma