ISHIDA Kouichi | Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
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概要
Department of Electrical Engineering, Faculty of Engineering, Hiroshima University | 論文
- Highly Selective SiO_2 Etching Using CF_4/C_2H_4
- Effect of Hydrogen Dilution on Structure of a-Si:H Prepared by Substrate Impedance Tuning Technique : Condensed matter
- Preservation of pathological tissue specimens by freeze-drying for immunohistochemical staining and various molecular biological analyses
- DSC Studies of Glassy Behavior in P-Doped a-Si:H : Condensed Matter
- Proton Nuclear Magnetic Resonance Studies on Structural Changes Induced by Annealing of Hydrogenated Amorphous Silicon Films Prepared at High Deposition-Rate