Yoko Takekawa | Advanced Lithography Process Technology Department, Device Process Development Center, Corporate Research & Development Center, Toshiba Corporation, Yokohama 235-8522, Japan
スポンサーリンク
概要
- 同名の論文著者
- Advanced Lithography Process Technology Department, Device Process Development Center, Corporate Research & Development Center, Toshiba Corporation, Yokohama 235-8522, Japanの論文著者
関連著者
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KOBAYASHI Sachiko
Advanced LSI Technology Laboratory, Toshiba Corporation
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Suigen Kyoh
Advanced Lithography Process Technology Department, Device Process Development Center, Corporate Research & Development Center, Toshiba Corporation, Yokohama 235-8522, Japan
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Soichi Inoue
Advanced Lithography Process Technology Department, Device Process Development Center, Corporate Research & Development Center, Toshiba Corporation, Yokohama 235-8522, Japan
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Kyoh Suigen
Advanced Lithography Process Technology Department, Device Process Development Center, Corporate Research & Development Center, Toshiba Corporation, Yokohama 235-8522, Japan
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Kotani Toshiya
Advanced Lithography Process Technology Department, Device Process Development Center, Corporate Research & Development Center, Toshiba Corporation, Yokohama 235-8522, Japan
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Yoko Takekawa
Advanced Lithography Process Technology Department, Device Process Development Center, Corporate Research & Development Center, Toshiba Corporation, Yokohama 235-8522, Japan
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Koji Nakamae
Department of Information Systems Engineering, Graduate School of Information Science and Technology, Osaka University, Suita, Osaka 565-0871, Japan
著作論文
- Full-Chip Layout Optimization for Process Margin Enhancement Using Model-Based Hotspot Fixing System