Sohn Woong-Hee | Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd., San #24, Nongseo-Ri, Yongin-City, Kyungki-Do 449-900, Korea
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- Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd., San #24, Nongseo-Ri, Yongin-City, Kyungki-Do 449-900, Koreaの論文著者
Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd., San #24, Nongseo-Ri, Yongin-City, Kyungki-Do 449-900, Korea | 論文
- Investigation of Chemical Vapor Deposition (CVD)-Derived Cobalt Silicidation for the Improvement of Contact Resistance
- Innovative Al Damascene Process for Nanoscale Interconnects