Takeichi Atsushi | Institute of Socio-Techno Science Technology, The University of Tokushima, Tokushima 770-8506, Japan
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Institute of Socio-Techno Science Technology, The University of Tokushima, Tokushima 770-8506, Japan | 論文
- Effect of Dielectric Barrier Discharge Air Plasma Treatment on TiO2 Thin Film Surfaces
- Characteristics of TiO2 Thin Film Surfaces Treated by Helium and Air Dielectric Barrier Discharge Plasmas
- Damage Analysis of Plasma-Etched n-GaN Crystal Surface by Nitrogen K Near-Edge X-ray Absorption Fine Structure Spectroscopy
- Comparison between Damage Characteristics of p- and n-GaN Surfaces Etched by Capacitively Coupled Radio Frequency Argon Plasmas (Special Issue : Dry Process)