PARK In | Semiconductor R & D Center, Samsung Electronics Co., Ltd
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概要
Semiconductor R & D Center, Samsung Electronics Co., Ltd | 論文
- Heterogeneous Particle Formation during Low Pressure Etching of Silicon Dioxide
- Characteristics of a Stabilized Pulsed Plasma via Suppression of Side-Band Modes
- Effect of SiO_2 Film Deposition on the Ferroelectric Properties of a Pt/Pb(Zr,Ti)O_3/Pt Capacitor
- Preparation and Electrical Properties of SrTiO3 Thin Films Deposited by Liquid Source Metal-Organic Chemical Vapor Deposition (MOCVD)
- Preparation and Characterization of Iridium Oxide Thin Films Grown by DC Reactive Sputtering