Han Suk-Hee | Future Technology Research Division, Korea Institute of Science and Technology, Seoul 136-791, Korea
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- Future Technology Research Division, Korea Institute of Science and Technology, Seoul 136-791, Koreaの論文著者
Future Technology Research Division, Korea Institute of Science and Technology, Seoul 136-791, Korea | 論文
- Grain Growth Simulation of Damascene Interconnects: Effect of Overburden Thickness
- Gate Controlled Hall Effect Devices