Ju Dong-Hyuk | Technology Development Group, Advanced Micro Devices
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概要
Technology Development Group, Advanced Micro Devices | 論文
- Impact of Gate Microstructure on Complementary Metal-Oxide-Semiconductor Transistor Performance
- Reliability and Electromigration Failure Modes in Dual Inlaid Cu Interconnects
- Source/Drain Extension-to-Gate Overlap Scaling in Deep Sub-Micron MOSFETs