KANG Chang | Semiconductor R&D Samsung Electronics Co., Ltd.
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概要
Semiconductor R&D Samsung Electronics Co., Ltd. | 論文
- Heterogeneous Particle Formation during Low Pressure Etching of Silicon Dioxide
- Enhancement of Mask Selectivity in SiO_2 Etching with a Phase-Controlled Pulsed Inductively Coupled Plasma
- Characteristics of a Stabilized Pulsed Plasma via Suppression of Side-Band Modes