Uchiyama Akira | LSI Process Technology Division, Oki Electric Industry Co., Ltd.
スポンサーリンク
概要
LSI Process Technology Division, Oki Electric Industry Co., Ltd. | 論文
- Relationship between Nitrogen Profile and Reliability of Heavily Oxynitrided Tunnel Oxide Films for Flash Electrically Erasable and Programmable ROMs
- Effect of Nitrogen Profile on Tunnel Oxynitride Degradation with Charge Injection Polarity