JUNG Dong-Jin | Technology Development, Semiconductor R&D Center, Samsung Electronics Co.
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- Technology Development, Semiconductor R&D Center, Samsung Electronics Co.の論文著者
Technology Development, Semiconductor R&D Center, Samsung Electronics Co. | 論文
- The Effect of Al/Pt Interface Reaction on Lead-zirconate-titanate Capacitor and the Optimization of Via Contact for Double Metal Ferroelectric RAM
- An Optimized Via Contact Scheme of FeRAM for Double-Level Metallization and Beyond