Lai Chao-Sung | Department of Electronic Engineering, Chang Gung University, 259 Wen-Hwa 1st Road, Kwei-Shan, Tao-Yuan, Taiwan
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- Department of Electronic Engineering, Chang Gung University, 259 Wen-Hwa 1st Road, Kwei-Shan, Tao-Yuan, Taiwanの論文著者
Department of Electronic Engineering, Chang Gung University, 259 Wen-Hwa 1st Road, Kwei-Shan, Tao-Yuan, Taiwan | 論文
- Effects of Post CF4 Plasma Treatment on the HfO2 Thin Film
- Reoxidation after NH3 Plasma Nitridation for Multiple-Thickness Oxynitrides
- Thickness Effects on pH Response of HfO2 Sensing Dielectric Improved by Rapid Thermal Annealing