Miyamoto Makoto | R&D Division, Development & Technology Group, Hitachi Maxell Ltd., 6139-1 Ohnogo, Joso, Ibaraki 300-2595, Japan
スポンサーリンク
概要
- 同名の論文著者
- R&D Division, Development & Technology Group, Hitachi Maxell Ltd., 6139-1 Ohnogo, Joso, Ibaraki 300-2595, Japanの論文著者
関連著者
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Terao Motoyasu
Central Resarch Laboratory Hitachi Ltd.
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Hirotsune Akemi
Central Research Laboratory Hitachi Ltd.
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Tamura Reiji
R&D division, Hitachi Maxell Ltd., 6139-1 Ohnogo, Mitsukaido, Ibaragi 300-2595, Japan
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Miyauchi Yasushi
R&D Division, Development & Technology Group, Hitachi Maxell Ltd., 6139-1 Ohnogo, Joso, Ibaraki 300-2595, Japan
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Miyamoto Makoto
R&D Division, Development & Technology Group, Hitachi Maxell Ltd., 6139-1 Ohnogo, Joso, Ibaraki 300-2595, Japan
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Tokushuku Nobuhiro
Development Division, Hitachi-LG Data Storage, Inc., 4F MSC Center Bldg., 22-23 Kaigan 3-chome, Minato-ku, Tokyo 108-0022, Japan
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Hirotsune Akemi
Central Research Laboratory, Hitachi Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan
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Tokushuku Nobuhiro
Development division, Hitachi-LG Data Storage, Inc., 4F MSC Center Bldg., 22-23 Kaigan, 3-chome, Minato-ku, Tokyo 108-0022, Japan
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Tamura Reiji
R&D Division, Development & Technology Group, Hitachi Maxell Ltd., 6139-1 Ohnogo, Joso, Ibaraki 300-2595, Japan
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Tamura Reiji
R&D Division, Development and Technology Group, Hitachi Maxell Ltd., 6139-1 Ohnogo, Joso, Ibaraki 300-2595, Japan
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Miyauchi Yasushi
R&D Division, Development and Technology Group, Hitachi Maxell Ltd., 6139-1 Ohnogo, Joso, Ibaraki 300-2595, Japan
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Terao Motoyasu
Central Research Laboratory, Hitachi Ltd., 1-280 Higashi-Koigakubo, Kokubunji, Tokyo 185-8601, Japan
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Miyamoto Makoto
R&D Division, Development & Technology Group, Hitachi Maxell Ltd., 6139-1 Ohnogo, Joso, Ibaraki 300-2595, Japan
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Miyamoto Makoto
R&D Division, Development and Technology Group, Hitachi Maxell Ltd., 6139-1 Ohnogo, Joso, Ibaraki 300-2595, Japan
著作論文
- Improvement of Overwrite Jitter of a Phase-Change Optical Disk with Al-Alloy Double-Reflective-Layer Structure
- Optimization of Crystallization Characteristics for Phase-Change Optical Disk with Ag–Ge–Sb–Te Recording Film