Heo Jinhwa | Process Development Team, Semiconductor R&D Center, Memory Division, Samsung Electronics Co.

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• 同名の論文著者
• Process Development Team, Semiconductor R&D Center, Memory Division, Samsung Electronics Co.の論文著者

Process Development Team, Semiconductor R&D Center, Memory Division, Samsung Electronics Co. | 論文

• The Formation of High Temperature Stable Co-Silicide from Co_Ta_x/Si Systems
• A Study on the Germano-Silicide Formation in the Ni/Si_Ge_x System for CMOS Device Applications
• FEOL Process for Sub-100nm DRAM
• FEOL Process for Sub-100nm DRAM

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