Kobinata Hideo | Advanced Technology Development Division, NEC Electronics Corporation
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概要
Advanced Technology Development Division, NEC Electronics Corporation | 論文
- Optimized Source/Drain Ion Implantation Conditions for P-Channel Metal-Oxide-Semiconductor Field-Effect-Transistor Formation
- Estimation of Optimum Electron-Beam Projection Lithography Mask Biases Taking Coulomb Beam Blur into Consideration