KOMANO Hiroshi | Tokyo Ohka Kogyo Co., Ltd.
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概要
Tokyo Ohka Kogyo Co., Ltd. | 論文
- Low-E_a Chemical Amplification Resists for 193nm Lithography
- X-ray Reflectivity Study on Depth Profile of Acid Generator Distribution in Chemically Amplified Resists
- Enhancement of Acid Production in Chemically Amplified Resist for Extreme Ultraviolet Lithography
- Reactivity of Halogenated Resist Polymer with Low-Energy Electrons
- Proton Dynamics in Chemically Amplified Electron Beam Resists