Yamashita Yukinari | Organo Corporation, R&D Center, 4-4-1 Nishionuma, Sagamihara, Kanagawa 229-0012, Japan
スポンサーリンク
概要
関連著者
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Yamashita Yukinari
Organo Corporation, R&D Center, 4-4-1 Nishionuma, Sagamihara, Kanagawa 229-0012, Japan
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Shiohara Morio
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Yamashita Yukinari
Organo Corporation, R&D Center, 4-4-1 Nishionuma, Sagamihara, Kanagawa 229-0012, Japan
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Kondo Seiichi
Semiconductor Leading Edge Technologies Inc. (selete)
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Saito Shuichi
Semiconductor Leading Edge Technologies Inc. (selete)
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Noriaki Oda
Semiconductor Leading Edge Technologies, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Seiichi Kondo
Semiconductor Leading Edge Technologies, Inc., 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Shuichi Saito
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Saito Shuichi
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Tokuri Kentaro
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Noriaki Oda
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Kentaro Tokuri
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Morio Shiohara
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Futatsuki Takashi
Organo Corporation, R&D Center, 4-4-1 Nishionuma, Sagamihara, Kanagawa 229-0012, Japan
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Imai Masayoshi
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Yukinari Yamashita
Organo Corporation, R&D Center, 4-4-1 Nishionuma, Sagamihara, Kanagawa 229-0012, Japan
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Seiichi Kondo
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
著作論文
- Effect of Pattern Layout and Dissolved Oxygen in CO2 Rinse Water on Cu Corrosion during Post-Etch Cleaning
- Effect of Dissolved Oxygen on Cu Corrosion in Single Wafer Cleaning Process