Geun Young | Department of Advanced Materials Engineering, Sungkyunkwan University, Suwon 440-746, Korea
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概要
- Geun Young Yeom の詳細を見る
- 同名の論文著者
- Department of Advanced Materials Engineering, Sungkyunkwan University, Suwon 440-746, Koreaの論文著者
関連著者
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Hong Seung
Department Of Biological Sciences Dankook University
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Lim Jong
Department Of Advanced Materials Science And Engineering Sungkyunkwan University
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Geun Young
Department of Advanced Materials Engineering, Sungkyunkwan University, Suwon 440-746, Korea
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Gweon Gwang
Department of Materials Science and Engineering, Sungkyunkwan University, Suwon, Kyunggi-do 440-746, Korea
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Lim Jong
Department of Advanced Materials Engineering, Sungkyunkwan University, Suwon, Gyunggi-do 440-746, Korea
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Geun Young
Department of Materials Science and Engineering, Sungkyunkwan University, Suwon, Kyunggi-do 440-746, Korea
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Jong Hyeuk
Department of Advanced Materials Engineering, Sungkyunkwan University, Suwon 440-746, Korea
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Jong Hyeuk
Department of Materials Science and Engineering, Sungkyunkwan University, Suwon, Kyunggi-do 440-746, Korea
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Kyong Nam
Department of Materials Science and Engineering, Sungkyunkwan University, Suwon, Kyunggi-do 440-746, Korea
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Yi Yeon
Department of Materials Science and Engineering, Sungkyunkwan University, Suwon, Kyunggi-do 440-746, Korea
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Seung Pyo
Department of Advanced Materials Engineering, Sungkyunkwan University, Suwon 440-746, Korea
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Seung Pyo
Department of Materials Science and Engineering, Sungkyunkwan University, Suwon, Kyunggi-do 440-746, Korea
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Gwang Ho
Department of Advanced Materials Engineering, Sungkyunkwan University, Suwon 440-746, Korea
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Gwang Ho
Department of Materials Science and Engineering, Sungkyunkwan University, Suwon, Kyunggi-do 440-746, Korea
著作論文
- Effect of DC Bias Voltage on the Characteristics of Low Temperature Silicon–Nitride Films Deposited by Internal Linear Antenna Inductively Coupled Plasma Source
- Characteristics of Internal Inductively Coupled Plasma Source for Ultralarge-Area Plasma Processing