Naganawa Miki | Department of Applied Physics and Physico-Informatics, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama 223-8522, Japan

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概要

関連著者

Itoh Kohei
Department Of Applied Physics And Physico-informatics And Crest-jst Keio University
UEMATSU Masashi
Department of Applied Physics and Physico-Informatics, Keio University
KAWAMURA Yoko
Department of Life Science, Graduate School of Agricultural Science, Tohoku University
Shimizu Yasuo
Department 4 Technology Research Division 2 Honda R&d Co. Ltd. Automobile R&d Center
Nakamura Mitsutoshi
Selete, 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
Naganawa Miki
Department of Applied Physics and Physico-Informatics, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama 223-8522, Japan
Ito Hiroyuki
Selete, 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
Ishikawa Hideaki
Selete, 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
Ohji Yuzuru
Selete, 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
Kawamura Yoko
Department of Applied Physics and Physico-Informatics, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama 223-8522, Japan
Shimizu Yasuo
Department of Applied Physics and Physico-Informatics, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama 223-8522, Japan
Uematsu Masashi
Department of Applied Physics and Physico-Informatics, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama 223-8522, Japan
Itoh Kohei
Department of Applied Physics and CREST-JST, Keio University, Yokohama 223-8522, Japan
Itoh Kohei
Department of Applied Physics and Physico-Informatics, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama 223-8522, Japan

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著作論文

Accurate Determination of the Intrinsic Diffusivities of Boron, Phosphorus, and Arsenic in Silicon: The Influence of SiO2 Films

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