KOJIMA M. | Process Technology Development Div., Renesas Technology Corporation
スポンサーリンク
概要
関連著者
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ASAI K.
Process Technology Development Div., Renesas Technology Corporation
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KOJIMA M.
Process Technology Development Div., Renesas Technology Corporation
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Yutani A.
Process Technology Development Div. Renesas Technology Corporation
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ICHINOSE K.
Process Technology Development Div., Renesas Technology Corporation
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MAEKAWA K.
Process Technology Development Div., Renesas Technology Corporation
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Kono K.
Process Technology Development Division Renesas Technology Corporation
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MURATA T.
Process Technology Development Division, Renesas Technology Corporation
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TSUNEMINE Y.
Process Technology Development Division, Renesas Technology Corporation
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FUJISAWA M.
Process Technology Development Division, Renesas Technology Corporation
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MATSUURA M.
Process Technology Development Division, Renesas Technology Corporation
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Tsunemine Y.
Process Technology Development Division Renesas Technology Corporation
著作論文
- A Novel Contact-plug Process with Low Resistance Nucleation Layer Using B_2H_6-reduction W-ALD Method for 32nm CMOS Devices and Beyond
- Highly Reliable Cu Interconnect using Low Hydrogen Silicon Nitride Film Deposited at Low Temperature for Cu-Diffusion Barrier