Kanamoto Kyozo | Sendai Research Center Telecommunications Advancement Organization:depanment Of Materials Science Gr

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Sendai Research Center Telecommunications Advancement Organization:depanment Of Materials Science Gr | 論文

• Low-Temperature Formation of Thin-Gate SiO_2 Films by the Ultrahigh-Vacuum Chemical Vapor Deposition with Reduced Subcutaneous Oxidation Using Remote-Plasma-Activated Oxygen and Si_2H_6 : Surfaces, Interfaces, and Films

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