スポンサーリンク

Sendai Research Center Telecommunications Advancement Organization:depanment Of Materials Science Gr | 論文

• Low-Temperature Formation of Thin-Gate SiO_2 Films by the Ultrahigh-Vacuum Chemical Vapor Deposition with Reduced Subcutaneous Oxidation Using Remote-Plasma-Activated Oxygen and Si_2H_6 : Surfaces, Interfaces, and Films

スポンサーリンク