Matsui Yasuji | Aset Super-fine Sr Lithography Laboratory Co Ntt Telecommnications Energy Laboratories
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概要
Aset Super-fine Sr Lithography Laboratory Co Ntt Telecommnications Energy Laboratories | 論文
- Critical-Dimension Controllability of Chemically Amplified Resists for X-Ray Membrane Mask Fabrication
- Precise Delineation Characteristics of Advanced Electron Beam Mask Writer EB-X3 for Fabricating 1x X-Ray Masks
- Evaluation of Replicated Dynamic Random Access Memory Cell Patterns using X-Ray Lithography
- Effects of Mask Line-and-Space Ratio in Replicating near-0.1-μm Patterns in X-Ray Lithography
- Sub-0.15 μm Pattern Replication Using a Low-Contrast X-Ray Mask