Takeda H. | Materials and Devices Research Laboratories, Research and Development Center, Toshiba Corp.

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概要

関連著者

Nakahashi M.
Materials And Devices Research Laboratories Research And Development Center Toshiba Corp.
Wada K.
Materials and Devices Research Laboratories, Research and Development Center, Toshiba Corp.
Suenaga S.
Materials and Devices Research Laboratories, Research and Development Center, Toshiba Corp.
Yasuda K.
Materials and Devices Research Laboratories, Research and Development Center, Toshiba Corp.
Takeda H.
Materials and Devices Research Laboratories, Research and Development Center, Toshiba Corp.
Suenaga S.
Materials And Devices Research Laboratories Research And Development Center Toshiba Corp.

著作論文

IGTC-72 Nitridation of Various Plasma Spray Coatings on IN-738LC in a Nitrogen Gas Flow(Session C-6 SURFACE COATING)

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