Ohara Ryoichi | Advanced Lsi Technology Laboratory R&d Center Toshiba Corporation
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概要
Advanced Lsi Technology Laboratory R&d Center Toshiba Corporation | 論文
- Growth of Epitaxial SrTiO_3 on Epitaxial(Ti, Al)N/Si(100)Substrate Using Ti-Buffer Layer(Special Issue on Nonvolatile Memories)
- Electrical Properties and Thermodynamic Stability of Sr(Ti1-x,Rux)O3 Thin Films Deposited by Inductive-Coupling-Plasma-Induced RF Magnetron Sputtering