Shimada T | Presto Japan Science And Technology Corporation (jst) And Department Of Chemistry The University Of
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- 同名の論文著者
- Presto Japan Science And Technology Corporation (jst) And Department Of Chemistry The University Of の論文著者
Presto Japan Science And Technology Corporation (jst) And Department Of Chemistry The University Of | 論文
- Preparation of a-Si_N_x:H Film Using N_2 Microwave Afterglow Chemical Vapor Deposition Method
- Generation Mechanism of Tensile Stress in a-Si_N_x Films Prepared by Afterglow Plasma Chemical Vapor Deposition Technique
- Residual Stress of a-Si_N_x:H Films Prepared by Afterglow Plasma Chemical Vapor Deposition Technique
- High-Intensity Vacuum Ultraviolet Light Source in Windowless Photochemical Vapor Deposition Reactor and Its Application to a-Si:H Deposition
- Crystal and Electrical Characterizations of Oriented Yttria-Stabilized Zirconia Buffer Layer for the Metal/Ferroelectric/Insulator/Semiconductor Field-Effect Transistor