Arisumi Osamu | Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corp. | 論文
- Improved Electron-Beam/Deep-Ultraviolet Intralevel Mix-and-Match Lithography with 100 nm Resolution
- Fabrication of Micro-Marks for Electron-Beam Lithography
- Fabrication Process of Character Projection Mask for EB Lithography
- Recovery of SEM Image by In-Situ Cleaning of Contaminated Objective Aperture
- Reduction of Electron Beam Drift Caused by Deflecting Electrode by Downflow Cleaning Process