Omiya K | Toshiba Corp. Yokohama Jpn
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概要
Toshiba Corp. Yokohama Jpn | 論文
- Evaluation of Replicated Dynamic Random Access Memory Cell Patterns using X-Ray Lithography
- Effects of Mask Line-and-Space Ratio in Replicating near-0.1-μm Patterns in X-Ray Lithography
- Sub-0.15 μm Pattern Replication Using a Low-Contrast X-Ray Mask
- Analysis of Sub-0.15 μm Pattern Replication in Synchrotron Radiation Lithography
- Effect of Molecular Weight and Degree of Substitution on the Shear Modulus of Methyl Cellulose Gel by Means of Surface Wave Method (Short Note)