MANO Tsuyoshi | Fuji Industrial Research Institute of Shizuoka Prefecture
スポンサーリンク
概要
関連著者
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MANO Tsuyoshi
Fuji Industrial Research Institute of Shizuoka Prefecture
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SUGIYAMA Osamu
Fuji Industrial Research Institute of Shizuoka Prefecture
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NAKAYAMA Hiroshi
Fuji Industrial Research Institute of Shizuoka Prefecture
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SHIBUYA Yoshio
Fuji Industrial Research Institute of Shizuoka Prefecture
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高井 治
名大 理工総研
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高井 治
名古屋大学
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Sugiyama Osamu
Shizuoka Industrial Research Institute:(present Address)hamamatsu Industrial Research Institute Of S
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Shibuya Y
Fuji Industrial Research Institute Of Shizuoka Prefecture
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Sugiyama O
Fuji Industrial Research Institute Of Shizuoka Prefecture
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高井 治
名古屋大 大学院工学研究科
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TAKAI Osamu
EcoTopia Science Institute, Nagoya University
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高井 治
名古屋大学エコトピア科学研究所
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Takai Osamu
Center For Integrated Research In Science And Engineering Nagoya University
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Takai Osamu
Ecotopia Science Institute Nagoya University
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Takai Osamu
The Department Of Materials Processing Engineering Graduate School Of Engineering Nagoya University
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Suzuki Hisao
Department Of Electronic-mechanical Engineering Faculty Of Engineering Nagoya University
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Sugiyama Osamu
Fuji Industrial Research Institute of Shizuoka Prefecture, 2590-1 Obuchi, Fuji 417-8550, Japan
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Hoshi Yusuke
Department of Materials Science, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8561, Japan
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Shibuya Yoshio
Fuji Industrial Research Institute of Shizuoka Prefecture, 2590-1 Obuchi, Fuji 417-8550, Japan
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Mano Tsuyoshi
Fuji Industrial Research Institute of Shizuoka Prefecture, 2590-1 Obuchi, Fuji 417-8550, Japan
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Suzuki Hisao
Departmennt of Materials Science, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8561, Japan
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Suzuki Hisao
Department of Materials Science, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8561, Japan
著作論文
- Nanostructure and Composition of Carbon/Silicon Graded Film Produced by Ionization-Assisted Deposition
- Formation of Diamond-Like Carbon Based Double-Layer Film on Ti-6Al-4V Substrate by Ionization Deposition
- Fabrication and Electrical Properties of (Bi,La)4Ti3O12 Thin Films Deposited with Electric-Field-Assisted Annealing