Osaka T | Kagami Memorial Laboratory For Materials Science And Technology Waseda University
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概要
Kagami Memorial Laboratory For Materials Science And Technology Waseda University | 論文
- A Novel Process for Fabrication of Gated Silicon Field Emitter Array Taking Advantage of Ion Bombardment Retarded Etching
- A Novel Process for Fabrication of Gated Silicon Field Emitter Array Taking Advantage of Ion Bombardment Retarded Etching
- Fe Doping and Preparation of Semi-Insulating InP by Wafer Annealing under Fe Phosphide Vapor Pressure
- Growth of 100-mm-Diameter (100) InP Single Crystals by the Vertical Gradient Freezing Method
- Fullerene (C60) Nanostructures Having Interpenetrating Surfaces Prepared by Electrophoretic Deposition of C60 Nanoparticles in Water