Kakuno Keiichi | Division Of Electrical And Computer Engineering Yokohama National University
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概要
Division Of Electrical And Computer Engineering Yokohama National University | 論文
- Growth and Energy Bandgap Formation of Silicon Nitride Films in Radical Nitridation
- Invited Strain Engineering for SiGe Buffer Layers for High-Mobility Si Channels (先端デバイスの基礎と応用に関するアジアワークショップ(AWAD2005))
- Low-Temperature Formation of Epitaxial NiSi_2 Layers with Solid-Phase Reaction in Ni/Ti/Si(001) Systems
- Thermal Stability and Electrical Properties of (La_2O_3)_(Al_2O_3)_x Composite Films
- HfO_2 Film Formation Combined with Radical Nitridation and Its Electrical Characteristic