CHUANG Shiow-Huey | National Nano Device Laboratory

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概要

• Chuang Shiow-Hueyの詳細を見る
• 同名の論文著者
• National Nano Device Laboratoryの論文著者

関連著者

• Wang Ding-yeong

  Institute Of Electronics National Chiao Tung University

• YANG Jung-Yen

  National Nano Device Laboratories

• Huang Tiao-yuan

  Institute Of Electronics National Chiao Tung University

• CHIEN Chao-Hsin

  National Nano Device Laboratories

• Chang Chun-yen

  Institute Of Electronics National Chiao Tang University:national Nano-device Laboratories

• CHUANG Shiow-Huey

  National Nano Device Laboratory

• Leu Ching-chich

  National Nano Device Laboratories

• Huang T‐y

  National Chiao Tung Univ. Hsinchu Twn

• Chang Chun-yen

  Institute Of Electronics National Chiao Tung University

• HUANG Tiao-Yuan

  Institute of Electronics, National Chiao Tung University

• LEU Ching-Chich

  National Nano Device Laboratory

• HUANG Tiao-Yuan

  National Nano Device Laboratory

• Huang T-y

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University

• CHANG Chun

  National Nano Device Laboratory and Institute of Electronics National Chiao-Tang University

• Huang Tiao-yuan

  Institute Of Electronics National Chiao Tung University:national Nano Device Laboratories

• Chang C

  National Nano Device Laboratory

• Yang Jung-yen

  National Nano Device Laboratory

• Huang Tiao-Yuan

  Institute of Electronics, National Chiao Tung University, Taiwan 30050, R.O.C

• Leu Ching-Chich

  National Nano Device Laboratory, 1001-1 Ta-Hsueh Rd. Hsin-Chu 300, Taiwan

• Chuang Shiow-Huey

  National Nano Device Laboratory, 1001-1 Ta-Hsueh Rd. Hsin-Chu 300, Taiwan

• Chien Chao-Hsin

  National Nano Device Laboratory, 1001-1 Ta-Hsueh Rd. Hsin-Chu 300, Taiwan

• Chang Chun-Yen

  Institute of Electronics, National Chiao Tung University, Taiwan 30050, R.O.C

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著作論文

• Low-Pressure Crystallization of Sol-Gel-Derived PbZr_Ti_O_3 Thin Films at Low Temperature for Low-Voltage Operation
• Low-Pressure Crystallization of Sol–Gel-Derived PbZr0.52Ti0.48O3 Thin Films at Low Temperature for Low-Voltage Operation

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