YUKIMURA Ken | Department of Electrical Engineering, Faculty of Engineering, Doshisha University
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概要
関連著者
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YUKIMURA Ken
Department of Electrical Engineering, Faculty of Engineering, Doshisha University
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Yukimura Ken
Department Of Electrical Engineering Doshisha University
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Yukimura K
Doshisha University
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MARUYAMA Toshiro
Department of Chemical Engineering, Faculty of Engineering, Kyoto University
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Maruyama Toshiro
Department Of Chemical Engineering Faculty Of Engineering Kyoto University
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Nakamura Keiji
Department of Electrical Engineering, Nagoya University
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Maruyama T
Tokyo Inst. Technol. Yokohama Jpn
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Maruyama T
Faculty Of Engineering Niigata University
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Maruyama T
Meijo Univ. Nagoya Jpn
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Maruyama T
Department Of Photonics Ritsumeikan University
著作論文
- Silicorn Dioxide Thin Films Prepared from Silicon Tetraacetate Using ArF Excimer Laser by Chemical Vapor Deposition
- Electrical Characterization of Silicon Dioxide Thin Film Prepared by ArF Excimer Laser Chemical Vapor Deposition frorn Silicon Tetraacetate
- Optimum Conditions for NO Reduction Using Intermittent Dielectric Barrier Discharge at Atmospheric Pressure
- Structure and tribological properties of Ti-Al-N films prepared by plasma-based ion implantation mixing
- Deposition of Tungsten Carbide Thin Films by Simultaneous RF Sputtering
- Ar/O_2 gas pressure dependence of atomic components of zirconia prepared by intermittent zirconium arc PBII&D
- NO_x Removal Using Ammonia Radicals Prepared by Intermittent Dielectric Barrier Discharge at Atmospheric Pressure
- Surface Modification of Poly (tetrafluoroethylene) Film Using Dielectric Barrier Discharge of Intermittent Pulse Voltage