Shima Kunihiro | Tandem Accelerator Center University Of Tsukuba
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概要
関連著者
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Shima Kunihiro
Tandem Accelerator Center University Of Tsukuba
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ISHII Satoshi
Tandem Accelerator Center, University of Tsukuba
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Ishii Satoshi
Tandem Accelerator Center University Of Tsukuba
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金子 豊
京都大学大学院情報学研究科
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Trautmann Dirk
Institute For Physics University Of Basel
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Kaneko Y
Sophia Univ. Tokyo
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Schuch Reinhold
The Institute Of Physical And Chemical Research (riken):afi Research Institute Of Physics
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Kaneko Y
Department Of Physics Faculty Of Science Tokyo Metropolitan University
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KAMBARA Tadashi
Atomic Physics Laboratory, RIKEN
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AWAZU Koichi
Electrotechnical Laboratory
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Awaya Y
Institute Of Physics And Chemical Research (riken)
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KANAI Yasuyuki
The INstitute of Physical and Chemical Research(RIKEN)
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Awazu K
National Inst. Of Advanced Industrial Sci. And Technol. (aist) Tsukuba Jpn
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KAMBARA Tadashi
Institute of Physical and Chemical Research (RIKEN)
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Kambara T
Atomic Physics Laboratory Riken
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Kambara Tadashi
The Institute Of Physical And Chemical Research
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Awaya Yohko
The Insitute Of Physical And Chemical Research
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MIZOGAWA Tatsumi
The Institute of Physical and Chemical Research (RIKEN)
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Kanai Y
Atomic Phys. Lab. Riken
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Awazu Koichi
Photonic Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)
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Roorda Sjoerd
Groupe de Recherche en Physique et Technologie des Couches Minces (GCM), Département de Physique, Un
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Brebner John
Groupe de Recherche en Physique et Technologie des Couches Minces (GCM), Département de Physique, Un
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Brebner John
Groupe De Recherche En Physique Et Technologie Des Couches Minces (gcm) Department De Physique Unive
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Roorda Sjoerd
Groupe De Recherche En Physique Et Technologie Des Couches Minces (gcm) Department De Physique Universite De Montreal
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Kanai Yasuyuki
The Institute of Physical and Chemical Research
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SHIMA Kunihiro
Tandem Accelerator Center,University of Tsukuba
著作論文
- Impact Parameter Dependent Probability of Au L_3-Shell Ionization by 40.7 MeV Ar Ions
- Formation of Individual Holes in Amorphous SiO_2 by Swift Heavy-Ion Bombardment Followed by Wet and Dry Etching
- Structure of Latent Tracks Created by Swift Heavy Ions in Amorphous SiO2 and Zinc Phosphate Glass