Kiuchi Masato | National Inst. Advanced Industrial Sci. And Technol. Osaka Jpn
スポンサーリンク
概要
関連著者
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Kiuchi Masato
National Inst. Advanced Industrial Sci. And Technol. Osaka Jpn
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Matsukawa Mami
Faculty Of Engineering Doshisha University
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OHTORI Norikazu
Graduate school of science and technology, Niigata, University
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Ohtori Norikazu
Graduate School Of Science And Technology Niigata University
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MURATA Satoshi
Faculty of Engineering, Doshisha University
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MATSUMOTO Takashi
Plasma Physics Laboratory, Osaka University
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SUGIMOTO Satoshi
Plasma Physics Laboratory, Osaka University
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GOTO Seiichi
Plasma Physics Laboratory, Osaka University
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KIUCHI Masato
National Institute of Advanced Industrial Science and Technology
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Yanagitani Takahiko
AIST
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GOTO Shu
Development Center. Sony Shiroishi Semiconductor Inc
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MURATA Setsuko
NTT Interdisciplinary Research Laboratories
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Matsukawa M
Doshisha Univ. Kyoto Jpn
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WATANABE Yoshiaki
Faculty of Engineering, Doshisha University
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Goto Seiichi
Plasma Physics Laboratory Faculty Of Engineering Osaka Univers
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Kiuchi Masato
Aist
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Yanagitani Takahiko
Faculty of Engineering, Doshisha University
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Yanagitani Takahiko
Faculty Of Engineering Doshisha University
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Watanabe Yoshiaki
Faculty Of Engineering Doshisha University
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Murata Satoshi
Faculty Of Engineering Doshisha University
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Matsumoto T
Plasma Physics Laboratory Osaka University
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Sugimoto Satoshi
Plasma Physics Laboratory Osaka University
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Yanagitani Takahiko
National Institute of Advanced Industrial Science and Technology, 1-8-31 Midorigaoka, Ikeda, Osaka 563-8577, Japan
著作論文
- Nondestructive Evaluation of SiC Layer by Brillouin Scattering Method (Short Note)
- P1-16 Characteristics of shear mode FBAR using (112^^-0) textured ZnO films(Poster session 1)
- Highly Oriented ZnO Thin Films Deposited by Grazing Ion-Beam Sputtering: Application to Acoustic Shear Wave Excitation in the GHz Range