SAKATA Atsuko | Microelectronics Engineering Laboratory, Toshiba Corporation

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概要

• SAKATA Atsukoの詳細を見る
• 同名の論文著者
• Microelectronics Engineering Laboratory, Toshiba Corporationの論文著者

関連著者

• SAKATA Atsuko

  Microelectronics Engineering Laboratory, Toshiba Corporation

• Sakata Akira

  Microelectronics Engineering Laboratory Toshiba Corporation

• KOIKE Mitsuo

  Environmental Engineering Laboratory, Research and Development Center, Toshiba Corporation

• Koike Mitsuo

  Environmental Engineering Laboratory Toshiba Corporation

• Koike Mitsuo

  Environmental Engineering Laboratory R&d Center Toshiba Corporation

• Koyama M

  Advanced Lsi Technology Laboratory Toshiba Corporation

• Tomita M

  Environmental Engineering Laboratory R&d Center Toshiba Corporation

• TOMITA Mitsuhiro

  Environmental Engineering Laboratory, R&D Center, Toshiba Corporation

• KOYAMA Masato

  ULSI Research Laboratories, Toshiba Corporation

• KUNISHIMA Iwao

  ULSI Research Laboratories, Toshiba Corporation

• Koike M

  Toshiba Corp. Yokohama Jpn

• Kunishima I

  Toshiba Corp. Yokohama Jpn

• Kunishima Iwao

  Ulsi Research Center Toshiba Corporation

• Tomita Mitsuhiro

  Environmental Engineering Laboratory, R&D Center, Toshiba Corporation

• ONAKA Takashi

  Department of Astronomy, School of Science, The University of Tokyo

• Onaka Takashi

  Department Of Astronomy Faculty Of Science University Of Tokyo

• Tanabe Toshihiko

  Department Of Astronomy Faculty Of Science University Of Tokyo

• Wada Setsuko

  Laboratory Of Chemistry University Of Electro-communications

• AKUTSU Haruko

  Microelectronics Engineering Laboratory, TOSHIBA Corporation

• KAMIJO Fumio

  Department of Astronomy, Faculty of Science, University of Tokyo

• SAKATA Akira

  Laboratory of Applied Science, University of Electro-Communications

• Akutsu Haruko

  Microelectronics Engineering Laboratory Toshiba Corporation

• Kamijo Fumio

  Department Of Astronomy Faculty Of Science University Of Tokyo

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著作論文

• Anomalous Junction Leakage Behavior of Ti Self Aligned Silicide Contacts on Ultra-Shallow Junctions
• Anomalous Junction Leakage Behavior of Ti-SALICIDE Contacts on Ultra-Shallow Junctions
• Simulation of the Formation of Dust Grains in Space by a Plasma Jet Apparatus

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