Lim Hyuneui | Advanced Analysis Center Korea Institute Of Science And Technology
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概要
関連著者
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Lim Hyuneui
Advanced Analysis Center Korea Institute Of Science And Technology
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Kim Young-woo
Department Of Physics Hanyang University-ansan
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Kim Gon-ho
Department Of Nuclear Engineering Seoul National University
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Cho Jeonghee
Department Of Physics Hanyang University-ansan
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Jung Hye
Advanced Analysis Center Korea Institute Of Science And Technology
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Kim Ok
Department Of Environmental Engineering Anyang University Anyangshi
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Kim Hyo
Department of Internal Medicine, Seoul National University College of Medicine, Cardiovascular Labor
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Lee Jeong
Department of Obstetrics and Gynaecology, College od Medicine, Soonchunhyang University
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Lee J
Korea Advanced Inst. Sci. And Technol. Daejon Kor
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Kim H
Chungnam National Univ. Taejon Kor
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Choo Woong
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology
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Kim Ok
Department of Obstetrics and Gynecology of Catholic University of Korea
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Yang Jae
Department Of Preventive Medicine Seoul National University College Of Medicine
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Kwon J
Posco Electronic Control Co. Ltd.
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Lim H
Seoul National Univ. Seoul Kor
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Lim Hoon
Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology
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Kim O
Hanyang Univ.‐ansan Kyunggi‐do Kor
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KWON Jeong
Posco Electronic Control Co., Ltd.
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CHUN Chang
Materials Characterization Lab., Agency for Defense Development
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CHO Jeonghee
Department of Physics, Hanyang University-Ansan
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LEE Yeonhee
Advanced Analysis Center, Korea Institute of Science and Technology
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KIM Gon-Ho
Department of Physics, Hanyang University-Ansan
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LIM Hyuneui
Advanced Analysis Center, Korea Institute of Science and Technology
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JUNG Hye
Advanced Analysis Center, Korea Institute of Science and Technology
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Choo Woong
Department Of Material Science And Engineering Korea Advanced Institute Of Science And Technology
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Choo W
Korea Advanced Inst. Sci. And Technol. Taejon Kor
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Yang J
Sung Kyun Kwan Univ. Suwon Kor
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Kim Gon-ho
Department Of Physics Hanyang University-ansan
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Lee Yeonhee
Advanced Analysis Center Korea Institute Of Science And Technology
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Yang Jae
Department Of Ob
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Lee Jeong
Department Of Clothing And Textiles Gyeongsang National University
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Yang Ji
Department Of Physics Bk21 Physics Research Division And Institute Of Basic Science Sung Kyun Kwan U
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Kim Hyo
Department Of Biological Sciences University Of Ulsan
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Han Seunghee
Advanced Analysis Center Korea Insitute Of Science & Technology
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Chun Chang
Materials Characterization Lab. Agency For Defense Development
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Lee Jeong
Department Of Animal Science And Biotechnology Kyungpook National University
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Lee Jeong
Department Of Anesthesiology And Pain Medicine Yonsei University College Of Medicine
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Kim Ok
Department Of Physics Hanyang University-ansan
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Yang Jae
Department Of Biological Environment Kangwon University
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Kim Hyo
Department Of Agro-environmental Sciences Faculty Of Agriculture Kyushu University
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Lee Yeonhee
Advanced Analysis Center Korea Insitute Of Science & Technology
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Lim Hyuneui
Advanced Analysis Center, Korea Institute of Science and Technology, Seoul 136-791, Korea
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LIM Hoon
Department of Electronic Materials Engineering, Korea Advanced Institute of Science and Technology
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CHOO Woong
Department of Electronic Materials Engineering, Korea Advanced Institute of Science and Technology
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Jung Hye
Advanced Analysis Center, Korea Institute of Science and Technology, Seoul 136-791, Korea
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Lee Yeonhee
Advanced Analysis Center, Korea Institute of Science and Technology, Seoul 136-791, Korea
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Cho Jeonghee
Department of Physics, Hanyang University-Ansan, Kyunggi-do 425-791, Korea
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Kim Young-Woo
Department of Physics, Hanyang University-Ansan, Kyunggi-do 425-791, Korea
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Kim Gon-Ho
Department of Physics, Hanyang University-Ansan, Kyunggi-do 425-791, Korea
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Han Seunghee
Advanced Analysis Center, Korea Institute of Science and Technology, Seoul 136-791, Korea
著作論文
- Crystal Structure and B-Site Ordering in Antiferroelectric Pb(Mg_W_)O_3, Pb(Co_W_)O_3 and Pb(Yb_Nb_)O_3
- Plasma Source Ion Implantation for Ultrashallow Junctions: Low Energy and High Dose Rate
- Plasma Source Ion Implantation for Ultrashallow Junctions: Low Energy and High Dose Rate