Jung Mina | Institute For Materials Research (imr) Tohoku University

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概要

• 同名の論文著者
• Institute For Materials Research (imr) Tohoku Universityの論文著者

関連著者

• Jung Mina

  Institute For Materials Research (imr) Tohoku University

• Usami Noritaka

  Institute For Material Research Tohoku University

• Saito Takanobu

  Institute For Materials Research

• Suemasu Takashi

  Institute Of Applied Physics University Of Tsukuba

• Okada Atsushi

  Institute Of Applied Physics University Of Tsukuba

• USAMI Noritaka

  Institute for Materials Research, Tokoku University

• Usami Noritaka

  Institute Of Materials Research Tohoku University

• SUEMASU Takashi

  Institute of Applied Physics, University of Tsukuba

• JUNG Mina

  Institute for Materials Research (IMR), Tohoku University

• OKADA Atsushi

  Institute of Applied Physics, University of Tsukuba

• SAITO Takanobu

  Institute of Applied Physics, University of Tsukuba

• Kawazoe Yoshiyuki

  Institute For Material Research Tohoku University

• Saito Takanobu

  Institute Of Applied Physics University Of Tsukuba

• Saito Takanobu

  Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan

• Chung Chan-Yeup

  Institute for Materials Research (IMR), Tohoku University, Sendai 980-8577, Japan

• SUEMASU Takashi

  Institlite of Materials Science, University of Tsukuba

• Suemasu Takashi

  Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan

• Usami Noritaka

  Institute for Materials Research (IMR), Tohoku University, Sendai 980-8577, Japan

• Jung Mina

  Institute for Materials Research (IMR), Tohoku University, Sendai 980-8577, Japan

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著作論文

• On the Controlling Mechanism of Preferential Orientation of Polycrystalline-Silicon Thin Films Grown by Aluminum-Induced Crystallization
• In situ observation of polycrystalline silicon thin films grown using aluminum-doped zinc oxide on glass substrate by the aluminum-induced crystallization (Special issue: Solid state devices and materials)
• In situ Observation of Polycrystalline Silicon Thin Films Grown Using Aluminum-Doped Zinc Oxide on Glass Substrate by the Aluminum-Induced Crystallization

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