Boeck Jo | Imec Vzw

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概要

• 同名の論文著者
• Imec Vzwの論文著者

Imec Vzw | 論文

• "Mask Enhancer" Technology on ArF Immersion Tool for 45-nm-Node Complementary Metal Oxide Semiconductor with 0.249μm^2 Static Random Access Memory Contact Layer Fabrication
• “Mask Enhancer” Technology on ArF Immersion Tool for 45-nm-Node Complementary Metal Oxide Semiconductor with 0.249 μm2 Static Random Access Memory Contact Layer Fabrication
• Impact of Organic Contamination on Thin Gate Oxide Quality
• Gate Voltage Dependence of Reliability for Ultra-Thin Oxides
• Reliability of Ultra-Thin Gate Oxide Below 3 nm in the Direct Tunneling Regime

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