Kim E‐s | Lsi Process Architecture Lsi Development Team System-lsi Division Samsung Electronics Co. Ltd.
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- Lsi Process Architecture Lsi Development Team System-lsi Division Samsung Electronics Co. Ltd.の論文著者
Lsi Process Architecture Lsi Development Team System-lsi Division Samsung Electronics Co. Ltd. | 論文
- Viewing Angle Enhancement of Three-Dimension/Two-Dimension Convertible Integral Imaging Display Using Double Collimated or Noncollimated Illumination
- Numerical Analysis of One-Dimensional Magnetophotonic Crystals with an Active Layer of a Highly Bi-Substituted Iron Garnet
- Degradation Phenomenon of p+to p+ Isolation Characteristics Caused by Carrier Injection in a High-Voltage Process
- Process Design for Preventing the Gate Oxide Thinning in the Integration of Dual Gate Oxide Transistor
- New STI Scheme to Compensate Gate Oxide Thinning at STI Corner Edge for the Devices Using Thick Dual Gate Oxide