Kaneda Shigeo | Department Of Electronics Faculty Of Engineering Nagaoka University Of Technology
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Department Of Electronics Faculty Of Engineering Nagaoka University Of Technology | 論文
- Chemical Vapor Deposition of Low Hydrogen Content Silicon Nitride Films Using Microwave-Excited Hydrogen Radicals
- Growth of Amorphous SiN Films by Chemical Vapor Deposition Using Monomethylamine
- Hydrogen-Radical-Assisted Chemical Vapor Deposition of SiN Films Using Si(CH_3)_4 and NH_2CH_3
- Theoretical Calculation on the Temperature Dependence of Electrical Properties in Thin Films of Bismuth and Bismuth Antimony Alloys
- Thin Films of Bi-Sb Alloy Having Nearly Constant Resistance in the Wide Range of Temperature Variation