MIYANAGA Akiharu | Semiconductor Energy Laboratory Co.,Ltd.
スポンサーリンク
概要
関連著者
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MIYANAGA Akiharu
Semiconductor Energy Laboratory Co.,Ltd.
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Miyanaga Akiharu
Semiconductor Energy Laboratory Co. Ltd.
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Yamazaki Shumpei
Semiconductor Energy Laboratory Co., Ltd.
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Yamazaki Shumpei
Semiconductor Energy Laboratory Co. Ltd.
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Fukuyama Hidetoshi
Institute For Solid State Physics University Of Tokyo
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Fukuyama Hidetoshi
Department Of Physics Univercsity Of Tokyo
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Fukuyama Hidetoshi
Institute For Solid State Physics The University Of Tokyo
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MIYANAGA Akiharu
Department of Physics,University of Tokyo
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HASEGAWA Yasumasa
Institute for Solid State Physics,University of Tokyo
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HONGO Masashi
Semiconductor Energy Laboratory Co., Ltd.
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TAKEMRA Yasuhiko
Semiconductor Energy Laboratory Co., Ltd.
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WAKAIZUMI Kazuhiro
Semiconductor Energy Laboratory Co., Ltd.
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KADONO Masaya
Semiconductor Energy Laboratory Co., Ltd.
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INOUE Tohru
Semiconductor Energy Laboratory Co., Ltd.
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Wakaizumi Kazuhiro
Semiconductor Energy Laboratory Co. Ltd.
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Kadono Masaya
Semiconductor Energy Laboratory Co. Ltd.
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Hasegawa Y
Department Of Material Science Graduate School Of Science Himeji Institute Of Technology Ako
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Hongo Masashi
Semiconductor Energy Laboratory Co. Ltd.
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Hasegawa Y
Himeji Inst. Of Technol. Hyogo
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Hasegawa Yasumasa
Institute For Solid State Physics University Of Tokyo
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Miyanaga A
Department Of Physics University Of Tokyo
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Takemra Yasuhiko
Semiconductor Energy Laboratory Co. Ltd.
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Inoue Tohru
Semiconductor Energy Laboratory Co. Ltd.
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Hasegawa Yasumasa
Department Of Material Science Graduate School Of Science Himeji Institute Of Technology
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Hasegawa Yasumasa
Department of Material Science, Graduate School of Science, Himeji Institute of Technology
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FUKUYAMA Hidetoshi
Institute for Materials Research, Tohoku University
著作論文
- Superconductivity near Charge Transfer Instability in CuO_2 Structure
- A New Bismuth-Containing Cuprate, Bi_2LaCaCuO_, as an Insulator Phase of Superconductor Bi_2Sr_2CuO_ : Electrical Properties of Condensed Matter
- CH_3OH Concentration and Total Pressure Dependence of Diamond Films Formed from CH_3OH-H_2 Mixed Gas by Magnet-Active Microwave Plasma Chemical Vapor Deposition