Gocho Tetsuo | Ulsi R & D Laboratories Sony Corporarion Atsugi Technology Center
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概要
Ulsi R & D Laboratories Sony Corporarion Atsugi Technology Center | 論文
- Chemical Vapor Deposition of Anti-Reflective Layer Film for Excimer Laser Lithography
- Formation of Dielectric Films for Gap-Filling by NH_3-Added H_2O-Tetraethoxysilane Plasma Chemical Vapor Deposition